Journal of Micro-Nanolithography MEMS and MOEMS

Journal of Micro-Nanolithography MEMS and MOEMS

期刊周期:Quarterly
研究方向:工程技术
影响因子:1.193
通讯地址:SPIE-SOC PHOTOPTICAL INSTRUMENTATION ENGINEERS, 1000 20TH ST, PO BOX 10, BELLINGHAM, USA, WA, 98225
官网:http://www.spie.org/publications/journals/journal-of-micro/nanolithography-mems-and-moems
投稿地址:https://jm3.msubmit.net/cgi-bin/main.plex
审稿速度:较慢,6-12周

  中文简介

《微纳米光刻机MEMS和MOEMS杂志》(JM3)发表了有关光刻、制造、包装和集成技术的科学、发展和实践的论文,以满足电子、MEMS、MOEMS和光子学行业的需要。这类装置的范围很广,包括生物医学微装置、微流体、传感器和执行器、自适应光学和数字微镜。范围广泛,有助于促进期刊服务的社区之间的协同作用和利益。

  英文简介

The Journal of Micro-Nanolithography MEMS and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

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