INTEGRATED FERROELECTRICS

INTEGRATED FERROELECTRICS

集成铁电体

期刊周期:Monthly
研究方向:工程技术
影响因子:0.486
通讯地址:TAYLOR & FRANCIS LTD, 4 PARK SQUARE, MILTON PARK, ABINGDON, ENGLAND, OXON, OX14 4RN
官网:http://www.tandfonline.com/toc/ginf20/current
投稿地址:http://www.tandfonline.com/action/authorSubmission?journalCode=ginf20&page=instructions
审稿速度:约3.0个月

  中文简介

集成铁电学为从事集成铁电器件研究、设计、开发、制造和应用的电子工程师、物理学家、过程和系统工程师、陶艺家和化学家提供了一个国际性、跨学科的论坛。这种器件将铁电薄膜和半导体集成电路芯片结合起来。其结果是一种新型的电子器件,它结合了铁电材料独特的非挥发性存储器、热释电、压电、光折变、硬辐射、声学和/或介电性能,以及半导体集成电路技术的动态存储器、逻辑和/或放大性能、小型化和低成本优势。

  英文简介

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

  近年期刊影响因子趋势图

  相关工程技术SCI期刊推荐

SCI服务

搜论文知识网 冀ICP备15021333号-3