MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING期刊中文简介
半导体加工中的材料科学为讨论光电子、传感器、探测器、生物技术和绿色能源的功能材料和器件的新加工、应用和理论研究提供了一个独特的论坛。每一期将致力于提供当前的快照的见解、新成果,突破和未来趋势等不同领域的微电子、能源转换和存储、通信、生物技术(图)催化、纳米薄膜技术,混合和复合材料、化学处理、气相沉积、设备制造、和造型的支柱先进半导体加工和应用。覆盖范围将包括:用于亚微米设备的先进光刻技术;蚀刻及相关课题;离子注入;损害演化及其相关问题;等离子体和热CVD;快速热处理;先进的金属化和互连方案;介质层薄，氧化;溶胶-凝胶法加工;化学浴和(电)化学沉积;化合物半导体加工;新型非氧化物材料及其应用(宏观)分子和杂化材料;分子动力学、从头算方法、蒙特卡罗方法等;分立电路和集成电路的新材料和新工艺;磁性材料和自旋电子学;异质结构和量子器件;半导体光电特性工程;晶体生长机制;可靠性，缺陷密度，固有杂质和缺陷。
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING期刊英文简介
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING期刊近年期刊自引率趋势图
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING期刊JCR分区
| JCR分区等级 | JCR所属学科 | 分区 | 影响因子 |
| Q2 | MATERIALS SCIENCE, MULTIDISCIPLINARY | Q2 | 4.644 |
| PHYSICS, APPLIED | Q2 | ||
| PHYSICS, CONDENSED MATTER | Q2 | ||
| ENGINEERING, ELECTRICAL & ELECTRONIC | Q2 |
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING近年期刊影响因子趋势图
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING期刊CiteScore数值
| CiteScore | SJR | SNIP | 学科类别 | 分区 | 排名 | 百分位 |
| 6.70 | 0.687 | 1.062 | 大类：Engineering 小类：Mechanical Engineering | Q1 | 84 / 601 |
86% |
| 大类：Engineering 小类：Mechanics of Materials | Q1 | 57 / 384 |
85% |
|||
| 大类：Engineering 小类：Condensed Matter Physics | Q1 | 68 / 415 |
83% |
|||
| 大类：Engineering 小类：General Materials Science | Q1 | 100 / 455 |
78% |
相关工程技术SCI期刊推荐
- SemimonthlyADVANCED MATERIALS
- Journal of Materials Chemistry A
- MonthlyADVANCED FUNCTIONAL MATERIALS
- SemimonthlyAPPLIED CATALYSIS B-ENVIRONMENTAL
- SemimonthlyJOURNAL OF HAZARDOUS MATERIALS
- SemimonthlyJOURNAL OF ALLOYS AND COMPOUNDS
- MonthlyBiotechnology for Biofuels
- Materials Science & Engineering C-Materials for Biological Applications
- MonthlySmall
- MonthlyJOURNAL OF THE ELECTROCHEMICAL SOCIETY
